• 尊龙凯时人生需要博

    The Prismo HiT3® system is engineered to mass produce deep UV LEDs with excellent process performance. It enables the growth of high-quality aluminum nitride and high-aluminum component materials. With a maximum reactor chamber temperature of 1400 Celsius degrees, the system can process up to 18 2-inch epitaxial wafers per run, with extendibility to 4-inch wafers, making it one of the highest throughput advanced tool of its kind in the industry.

    Prismo HiT3®

    MOCVD solution for deep UV LED mass production

    Products Features

    Enabling technology to grow high temperature AIN and UVC LEDs

    Excellent epi yield, with industry-leading efficiency and uniformity

    Novel design features for high quality and high AlN growth rate

    Innovative in-situ, real-time monitoring system

    Process temperature up to 1400℃ with excellent temperature uniformity and stability

    Highly stable and automatic vacuum transfer to prevent particle generation

    Fully automatic process with user-friendly interface

    Competitive Advantages

    Superb process performance, simplified process adjustment and improved production yield

    Up to 18x2” epitaxial wafers per run with low production cost

    Integrated lid lifting mechanism, simplified tool maintenance and improved equipment utilization

    Superior